<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="7.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Fayçal Djeffal</style></author><author><style face="normal" font="default" size="100%">Hichem Ferhati</style></author><author><style face="normal" font="default" size="100%">Benhaya, Abdelhamid</style></author><author><style face="normal" font="default" size="100%">Bendjerad, Adel</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Effects of high temperature annealing in enhancing the optoelectronic performance of sputtered ITO/Ag/ITO transparent electrodes, ISSN 0749-6036</style></title><secondary-title><style face="normal" font="default" size="100%">Superlattices and Microstructures</style></secondary-title></titles><dates><year><style  face="normal" font="default" size="100%">2019</style></year></dates><urls><web-urls><url><style face="normal" font="default" size="100%">https://www.sciencedirect.com/science/article/abs/pii/S0749603619307608</style></url></web-urls></urls><volume><style face="normal" font="default" size="100%">130</style></volume><pages><style face="normal" font="default" size="100%">361-368</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">&lt;p id=&quot;abspara0010&quot; style=&quot;text-align: justify;&quot;&gt;
	In this paper, a transparent conductive&amp;nbsp;&lt;em&gt;ITO/Ag/ITO&lt;/em&gt;&amp;nbsp;(&lt;em&gt;IAI&lt;/em&gt;) multilayer structure with a high Haacke Figure of Merit (&lt;em&gt;FoM&lt;/em&gt;) far surpassing those found up to now is experimentally demonstrated. An optimized&amp;nbsp;&lt;em&gt;IAI&lt;/em&gt;&amp;nbsp;multilayer electrode was elaborated by means of&amp;nbsp;&lt;em&gt;RF&lt;/em&gt;&amp;nbsp;magnetron sputtering technique. The structural and electrical characteristics of the prepared tri-layered design were investigated. The influence of the annealing process on the&amp;nbsp;&lt;em&gt;IAI&lt;/em&gt;&amp;nbsp;electrode performance was also carried out. Unlike the&amp;nbsp;&lt;em&gt;IAI&lt;/em&gt;&amp;nbsp;structure as-deposited, it was revealed that the annealed samples maintained an average transparency superior than&amp;nbsp;&lt;em&gt;89%&lt;/em&gt;. This behavior indicates the effectiveness of the thermal treatment for ensuring favorable light management. In addition, it was found that the annealing process paves a new path toward improving the electrode conductivity, where the heat treated electrode at&amp;nbsp;&lt;em&gt;600°C&lt;/em&gt;&amp;nbsp;yielded a very low sheet resistance of&amp;nbsp;&lt;em&gt;2.95Ω&lt;/em&gt; × &lt;em&gt;sq&lt;/em&gt;&lt;sup&gt;&lt;em&gt;−1&lt;/em&gt;&lt;/sup&gt;. Therefore, by well optimizing both&amp;nbsp;&lt;em&gt;IAI&lt;/em&gt;&amp;nbsp;geometry and annealing conditions, we were able to elaborate high-quality coating with a superior&amp;nbsp;&lt;em&gt;FoM&lt;/em&gt;&amp;nbsp;of&amp;nbsp;&lt;em&gt;120.8&lt;/em&gt; × &lt;em&gt;10&lt;/em&gt;&lt;sup&gt;&lt;em&gt;−3&lt;/em&gt;&lt;/sup&gt;&lt;em&gt;Ω&lt;/em&gt;&lt;sup&gt;&lt;em&gt;−1&lt;/em&gt;&lt;/sup&gt;. This makes the sputtered&amp;nbsp;&lt;em&gt;IAI&lt;/em&gt;&amp;nbsp;multilayer design a suitable alternative to the conventional&amp;nbsp;&lt;em&gt;ITO&lt;/em&gt;-based electrodes for optoelectronic and photovoltaic applications.
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